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All issues Europhysics News, 35 5 (2004) 149-152 Article references

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Cited article:

Study on the polishing mechanism of pH-dependent tribochemical removal in CMP of CaF2 crystal

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Tribology International 150 106370 (2020)
https://doi.org/10.1016/j.triboint.2020.106370

Christopher J. Evans, Luc Simard, Hideki Takami, Kjetil Dohlen, Arthur Vigan, David Mouillet, François Wildi, Jean-François Sauvage, Thierry Fusco, Jean-Luc Beuzit, Pascal Puget, David Le Mignant, Ronald Roelfsema, Johan Pragt, Hans Martin Schmid, Raffaele Gratton, Dino Mesa, Riccardo Claudi, Maud Langlois, Anne Costille, Emmanuel Hugot, Jared O'Neil, Juan Carlos Guerra, Mamadou N'Diaye, Julien Girard, et al.
9908 99083D (2016)
https://doi.org/10.1117/12.2233953

A high-resolution XUV-spectrometer for the study of laser-produced plasmas as light sources for lithography

F. Meijer
The European Physical Journal Special Topics 144 (1) 41 (2007)
https://doi.org/10.1140/epjst/e2007-00107-x

Surface generation of color centers in lithium fluoride by EUV-irradiation

E. Nichelatti, F. Bonfigli, A.Ya. Faenov, F. Flora, T. Marolo, M. Montecchi, R.M. Montereali, T. Pikuz and G. Baldacchini
Journal of Non-Crystalline Solids 351 (21-23) 1774 (2005)
https://doi.org/10.1016/j.jnoncrysol.2005.04.013