Flat inductive plasma for large area plasma processing (Vol. 48, No. 3)
Low temperature plasma generated by a resonant network antenna.
1 m2) is of fundamental importance for the industrial production of solar cells, flat panel displays, packaging, surface treatment, large area electronics, etc. Magnetic induction by RF oscillating currents in parallel legs is often used to drive the plasma in large inductive sources. In this work, the novel plasma source is a multiple LC resonant network antenna as shown in the figure. An electromagnetic model describes the antenna-plasma coupled system as a multi-conductor transmission line. Inspired by the “complex image” model for power transmission lines, this theory is used for the first time to calculate the induced image currents in the plasma. This approach could be applied generally to ICP antennas for large area plasma processing.
Ph. Guittienne, R. Jacquier, A. A. Howling and I. Furno,
Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source, Plasma Sources Sci. Technol. 26, 035010 (2017).