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Cited article:

Christopher J. Evans, Luc Simard, Hideki Takami, Kjetil Dohlen, Arthur Vigan, David Mouillet, François Wildi, Jean-François Sauvage, Thierry Fusco, Jean-Luc Beuzit, Pascal Puget, David Le Mignant, Ronald Roelfsema, Johan Pragt, Hans Martin Schmid, Raffaele Gratton, Dino Mesa, Riccardo Claudi, Maud Langlois, Anne Costille, Emmanuel Hugot, Jared O'Neil, Juan Carlos Guerra, Mamadou N'Diaye, Julien Girard, et al.
9908 99083D (2016)

A high-resolution XUV-spectrometer for the study of laser-produced plasmas as light sources for lithography

F. Meijer
The European Physical Journal Special Topics 144 (1) 41 (2007)