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Cited article:

Electron Emission from Insulators Irradiated by Slow Highly Charged Ions

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Potential sputtering of target ions by Arq+, Pbq+ projectiles from a silicon surface

T.S. Wang, Y.T. Zhao, H.B. Peng, et al.
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Potential sputtering

Friedrich Aumayr, M. W. Thompson, J. S. Colligon, R. Smith and Hannspeter Winter
Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences 362 (1814) 77 (2004)

Slow Highly Charged Ions -A New Tool For Surface Nanostructuring?-

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Modified Surface Nanoscale Explosion:  Effects of Initial Condition and Charge Flow

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Masked ion beam lithography with highly charged ions

J. D. Gillaspy, D. C. Parks and L. P. Ratliff
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 16 (6) 3294 (1998)

Gain of windowless electron multipliers 226EM and EMI 9643/2B for highly charged Ta ions

J. Krása, E. Woryna, M. P. Stöckli, S. Winecki and B. P. Walch
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L-shell Filling Rates of Highly Charged Ions in Metals

R. Díez Muiño, N. Stolterfoht, A. Arnau, A. Salin and P. M. Echenique
Physical Review Letters 76 (24) 4636 (1996)

Electron emission in slow collisions of He projectiles (He∗, He+, He++) with Li- and LiF-surfaces

F. Wiegershaus, S. Krischok, D. Ochs, W. Maus-Friedrichs and V. Kempter
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Formation and Coulomb dissociation of highly charged metal clusters in ion-cluster collisions

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Critical Sizes against Coulomb Dissociation of Highly Charged Sodium Clusters Obtained by Ion Impact

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